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Deep Trench Doping by Plasma Immersion Ion Implantation in Silicon [2010-09-01] |
Deep Trench Doping by Plasma Immersion Ion Implantation in Silicon AIP Conf. Proc. -- November 13, 2006 -- Volume 866, pp. 229-232 ION IMPLANTATION TECHNOLOGY: 16th International Conference on Ion Implantation Technology - IIT 2006; doi:10.1063/1.2401501 S. Nizou,1,2 V. Vervisch,3 H. Etienne,3 M. Ziti,1 F. Torregrosa,3 L. Roux,3 M. Roy,2 and D. Alquier1 附件下载 |