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Deep Trench Doping by Plasma Immersion Ion Implantation in Silicon
[2010-09-01]
Deep Trench Doping by Plasma Immersion Ion Implantation in Silicon
AIP Conf. Proc. -- November 13, 2006 -- Volume 866, pp. 229-232
ION IMPLANTATION TECHNOLOGY: 16th International Conference on Ion Implantation Technology - IIT 2006; doi:10.1063/1.2401501
S. Nizou,1,2 V. Vervisch,3 H. Etienne,3 M. Ziti,1 F. Torregrosa,3 L. Roux,3 M. Roy,2 and D. Alquier1
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