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Characterization of 4H-SiC epilayers grown at a high deposition rate
[2009-09-17]
Characterization of 4H-SiC epilayers grown at a high deposition rate
作者: Tsuchida, H.; Tsuji, T.; Kamata, I.; Jikimoto, T.; Fujisawa, H.; Ogino, S.; Izumi, K. 
来源出版物: Materials Science Forum 卷: 353-356  页: 131-4  出版年: 2001
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