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THE APPLICATION OF ION-BEAM MIXING, DOPED SILICIDE, AND RAPID THERMAL-PROCE [2011-04-01] |
| THE APPLICATION OF ION-BEAM MIXING, DOPED SILICIDE, AND RAPID THERMAL-PROCESSING TO SELF-ALIGNED SILICIDE TECHNOLOGY 作者: KU YH, LEE SK, KWONG DL 来源出版物: JOURNAL OF THE ELECTROCHEMICAL SOCIETY 卷: 137 期: 2 页: 728-740 出版年: FEB 1990 附件下载 |
