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GaSb Metal-Oxide-Semiconductor Capacitors with Atomic-Layer-Deposited HfAlO [2012-03-29] |
Chen, W., X. Min, et al. (2012). "
GaSb Metal-Oxide-Semiconductor Capacitors with Atomic-Layer-Deposited HfAlO as Gate Dielectric."
Electrochemical and Solid-State Letters 15(3): H51-H54H54
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