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Characterization of amorphous SICH thin films grown by RF plasma enhanced CVD on annealing temperature
[2025-12-18]

M. G. Park, W. S. Choi, J. H. Boo, Y. T. Kim, D. H. Yoon, B. Hong

Research output: Contribution to journal › Conference article › peer-review

Original languageEnglish
Pages (from-to)Pr4/155-Pr4/160
JournalJournal De Physique. IV : JP
Volume12
Issue number4
StatePublished - Jun 2002
Event13th European Conference on Chemical Vapor Deposition - Glyfada, Athens, Greece
Duration: 26 Aug 2001 → 31 Aug 2001

Characterization_of_amorphous_SICH_thin_films_grown_by_RF_plasma_enhanced_CVD_on_annealing_temperature.pdf