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Fabrication of hollow silicon microneedles using grayscale lithography and deep reactive ion etching
[2024-08-28]

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Volume42, Issue5

DOI:10.1116/6.0003711

Zhang, D (Zhang, Dong) [1] Hu, WH (Hu, Wenhan) [2] Cui, B (Cui, Bo) [2]


Fabrication_of_hollow_silicon_microneedles_using_grayscale_lithography_and_deep_reactive_ion_etching.pdf