The Engineering Research Center for Semiconductor Integrated Technology is an advanced technology platform for optoelectronics, microelectronics and MEMS. It was planned to be constructed by the Institute of Semiconductors in 2002 for the strategic development of the institute, Chinese Academy of Sciences and Chinese government. All the advanced equipments are over 100 million RMB for semiconductor key processes and measurements. The working area is 1,700 m2 for the clean rooms and 1,100 m2 for the office and test rooms. With the perfection of the standard service and management, the center has become the critical technical support department for research works, student training and technique exchange. The leader of the center is Prof. Fuhua YANG as the director and Prof. An JI as the vice director.
Main process equipments in the center include e-beam lithography system, MA6/BA6 double-side mask aligner and EVG mask aligner, induced coupling plasma (ICP) etching system for Si, SiO2, metal and III-V semiconductors, e-gun evaporator, ion beam sputter, magnetron sputter, plasma enhanced chemical vapor deposition (PECVD) system, low-pressure chemical vapor deposition (LPCVD), ion implantation system, thermal oxidation system, metallization system and wafer bonding system. Main measurement equipments include multi-channel fiber/waveguide coupling test system, spectrophotometer, surface profiler, low temperature probe station, network analyzer, semiconductor parameter analyzer, MEMS stability and spectrum testing system, solar simulator and solar cell tester.
The center is an open platform, offering not only technical services and project cooperation, but also consulting service of technology for researchers. In order to provide technical supports and equipments effectively, the center has joined many technology platforms of public services, such as Technology Joint Platform of Institutes in Chinese Academy of Sciences, Nano-apparatus Platform of Knowledge Innovation Engineering Base in Chinese Academy of Sciences, Beijing Nano-science Valued Apparatuses Area Center, Capital Science and Technology Platform and National Public Technology Service Platform. The utility ratio of main equipments is above 80%, and the share ratio is above 50%.
Prof. Yongxiang LU, president of the Chinese Academy of Sciences, visited the Institute of Semiconductors, CAS on August 28, 2006. He said: “The advantage of the Institute of Semiconductors is the combination of optoelectronics and microelectronics. The institute should further improve the ability of independent innovation and integrated technology, pushing on the construction of the technical platform. Engineering Research Center for Semiconductor Integrated Technology, constructed by own funds two years ago, has equaled to the above-middle level of the European technical centers. Both equipments and the working environment are so good that the strong core competition advantage has been formed for the third period innovation plan. Next, the platform would contribute to national scientific and technological innovation, being open to other institutes. The establishment of the center shows that the leader group has strong judgment ability, prospective idea and decision-making ability. It also shows the strong supports of all employees to the wise policy decision of leader group.”
The aim of the center is to continually improve the level and the ability of semiconductor technology to satisfy the scientific need of the institute; to develop the information technology to meet national great strategy and economic development; to make breakthrough in the pivotal and reliable technology to accelerate the transfer of research achievements; and to be open to the outside as a top technical center for student training, academic cooperation and communication.
