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Preparation of highly photoconductive amorphous silicon by rf sputtering
[2012-11-27]
Preparation of highly photoconductive amorphous silicon by rf sputtering ☆
T.D. Moustakas†,  D.A. Anderson,  William Paul
Division of Applied Sciences, Harvard University Cambridge, Massachusetts 02138, U.S.A.
Solid State Communications     Volume 23, Issue 3, July 1977, Pages 155–158
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