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Scaling of chlorosilane SiCCVD to multi-wafer epitaxy system [2009-09-23] |
| Scaling of chlorosilane SiCCVD to multi-wafer epitaxy system 作者: Wan J (Wan, J.), Loboda MJ (Loboda, M. J.), MacMillan MF (MacMillan, M. F.), Chung G (Chung, G.), Carlson EP (Carlson, E. P.), Torres VM (Torres, V. M.) Materials science forum 2007, vol. 556-57, pp. 145-148 附件下载 |
