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Single-source chemical vapor deposition of SiC films in a large-scale low-p
[2010-01-07]
Single-source chemical vapor deposition of SiC films in a large-scale low-pressure CVD growth, chemical, and mechanical characterization reactor
作者: Roper, CS; Radmilovic, V; Howe, RT, et al.
来源出版物: JOURNAL OF THE ELECTROCHEMICAL SOCIETY   卷: 153   期: 8   页: C562-
C566   出版年: 2006
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