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Use of chlorinated carbon and silicon precursors for epitaxial growth of 4H
[2012-03-07]

Use of chlorinated carbon and silicon precursors for epitaxial growth of 4H-SiC at very high growth rates (pages 157–159)
Siva Kotamraju, Bharat Krishnan and Yaroslav Koshka
physica status solidi (RRL) – Rapid Research Letters
Volume 3, Issue 5, pages 157–159, May 2009


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