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Growth of crystalline silicon carbide by CVD using chlorosilane gases [2009-10-14] |
标题: Growth of crystalline silicon carbide by CVD using chlorosilane gases
作者: Loboda, M.J.; MacMillan, M.F.; Wan, J., et al.
来源出版物: Mater. Res. Soc. Symp. Proc. Vol 911, p.49, 2006
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