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Fabrication of size controlled nanohole array on III-V semiconductor substr [2011-06-22] |
| Fabrication of size controlled nanohole array on III-V semiconductor substrate by ICP-RIE using nanoporous alumina mask 作者: Jung M (Jung, Mi), Lee S (Lee, Seok), Byun YT (Byun, Young Tae), Jhon YM (Jhon, Young Min), Kim SH (Kim, Sun Ho), Mho SI (Mho, Sun-Il), Woo DH (Woo, Deok Ha) 来源出版物: Advances in Nanomaterials and Processing, Pts 1 and 2 丛书: SOLID STATE PHENOMENA 卷: 124-126 页: 1301-1304 子辑: Part 1-2 出版年: 2007 附件下载 |
