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Preparation of lowdefectgrade a-Si:H films by RF magnetron sputtering techn
[2012-04-06]
Preparation of lowdefectgrade a-Si:H films by RF magnetron sputtering technique
W. Müller,  J. Pirrung,  B. Schröder,  J. Geiger    Solar Energy Materials    Volume 10, Issue 2, June–July 1984, Pages 171–186
Fachbereich Physik, Universität Kaiserslautern, D-6750 Kaiserslautern, Fed. Rep. Germany
Received 12 January 1984. Available online 3 March 2003


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