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The Formation of p-Type ZnO Films by Thermal Diffusion from the Low Energy, [2010-03-28] |
| The Formation of p-Type ZnO Films by Thermal Diffusion from the Low Energy, High Dose Phosphorus-Implanted Si Substrate J. Electrochem. Soc., Volume 157, Issue 4, pp. H435-H437 (2010) Yi-Jen Huang,1 Chung-Wei Liu,2 Sheng-Yuan Chu,1,3,4 and Kuang-Yao Lo2 附件下载 |
