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The influence of deposition parameters on the growth of a-SiGe:H alloys in [2011-08-17] |
| The influence of deposition parameters on the growth of a-SiGe:H alloys in a plasma CVD system Applied Surface Science, Volume 46, Issues 1-4, 2 December 1990, Pages 245-248 M. Zeman, I. Ferreira, M.J. Geerts, J.W. Metselaar 附件下载 |
