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Chemical Etch Characteristics of N-Face and Ga-Face GaN by Phosphoric Acid
[2012-02-17]
Chemical Etch Characteristics of N-Face and Ga-Face GaN by Phosphoric Acid and Potassium Hydroxide Solutions
J. Electrochem. Soc., Volume 159, Issue 2, pp. H117-H120 (2012)


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