首 页 >> 单篇全文
Optimizing HBr-Br2-H2O Etchants to Form Low Defect Regrowth Interfaces
[2012-05-24]
Optimizing HBr-Br2-H2O Etchants to Form Low Defect Regrowth Interfaces
for Highly Reliable InGaAsP/InP Buried-Heterostructure Lasers
J. Electrochem. Soc., Volume 150, Issue 2, pp. G117-G121 (2003)
K. Shinoda, A. Taike, H. Sato, and H. Uchiyama

附件下载