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850-nm oxide VCSEL development at Hewlett-Packard [2009-10-23] |
850-nm oxide VCSEL development at Hewlett-Packard
Hongyu Deng, James J. Dudley, Sui F. Lim, Chun Lei, Bing Liang, M. Tashima, Lee A. Hodge, Xuemei Zhang, John Herniman, and Robert W. Herrick
SPIE vol.3627 pp. 23-28
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