首 页 >> 单篇全文
Impact of Etching Chemistry and Sidewall Profile on Contact CD and Open performance in Advanced Logic Contact Etch
[2019-01-14]

Impact of Etching Chemistry and Sidewall Profile on Contact CD and Open performance in Advanced Logic Contact Etch

  • 【作 者】Wang, Xin-Peng;Zhang, Hai-Yang;Chang, Shih-Mou;Lee, Kwok-Fung;Sun, Wu;Huang, Yi

  • 【刊 名】CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE 2010 (CSTIC 2010)

  • 【出版日期】2010

  • 【卷 号】Vol.27

  • 【期 号】No.1

  • 【页 码】737-741

  • 【doi】10.1149/1.3360703

  • 1547433532235.pdf