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Silicon epitaxial growth on poly-Si film by HWCVD for low-temperature poly-
[2010-11-30]
Silicon epitaxial growth on poly-Si film by HWCVD for low-temperature poly-Si TFTs
作者: Lee SR (Lee, Seung Ryul), Ahn KM (Ahn, Kyung Min), Ahn BT (Ahn, Byung Tae)
来源出版物: JOURNAL OF THE ELECTROCHEMICAL SOCIETY    卷: 154    期: 9    页: H778-H781    出版年: 2007
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