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ON-PRODUCT EVALUATION OF WAFER-SURFACE PRECLEAN PROCESSES ON CMOS GATE-OXID [2009-12-16] |
| 【正题名】: ON-PRODUCT EVALUATION OF WAFER-SURFACE PRECLEAN PROCESSES ON CMOS GATE-OXIDE INTEGRITY 【个人作者姓名】: William A. Syverson; M. Joseph Fleming 【作者单位】:IBM Microelectronics Division 1000 River Street, Mail Zip 975B Essex Junction, VT 05452 USA 【团体作者名称】: The Electrochemical Society, Inc.; Proceedings Vol.99-36 【会议录\文集名】: Sixth International Symposium of Cleaning Technology in Semiconductor Device Manufacturing, 6th, Oct 1999, Honolulu, Hawaii 【文献其他题名】:Cleaning Technology in Semiconductor Device Manufacturing 【出版年】: 2000 【ISBN】: 1-56677-259-1 【页码】: p.51-58 【总页数】: 8 【会议年】: 1999 【会议召开地点】: Honolulu, Hawaii |
