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The influence of deposition parameters on the properties of amorphous silic
[2012-04-06]
The influence of deposition parameters on the properties of amorphous silicon thin films produced by the magnetron sputtering method   
  Thin Solid Films Volume 112, Issue 1, 3 February 1984, Pages 51–60
A.K. Batabyal,  P. Chaudhuri,  Swati Ray,  A.K. Barua
Indian Association for the Cultivation of Science, Calcutta 700032, India
Received 15 June 1983. Accepted 14 October 1983. Available online 18 September 2002
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