Microlithography: Science and Technology, Second Edition
Editor(s):  Bruce W. Smith, Rochester Institute of Technology, New York, USA;  Kazuaki Suzuki, Nikon Corporation, Tokyo, Japan

 

索书号：741.316/S968

 

Table of Contents
 
EXPOSURE SYSTEM
System Overview of Optical Steppers and Scanners; Michael S. Hibbs
Optical Lithography Modeling; Chris A. Mack
Optics for Photolithography; Bruce W. Smith
Excimer Laser for Advanced Microlithography; Palash Das
Alignment and Overlay; Gregg M. Gallatin
Electron Beam Lithography System; Kazuaki Suzuki
X-Ray Lithography; Takumi Ueno
EUV Lithography; Stefan Wurm and Charles Gwyn
Imprint Lithography; Douglas J. Resnick
RESISTS AND PROCESSING
Chemistry of Photoresist Materials; Takumi Ueno and Robert D. Allen
Resist Processing; Bruce W. Smith
Multilayer Resist Technology; Bruce W. Smith and Maureen Hanratty
Dry Etching of Photoresists; Roderick R. Kunz
METROLOGY AND NANOLITHOGRAPHY
Critical-Dimensional Metrology for Integrated-Circuit Technology; Herschel M. Marchman, Gian Lorusso, Mike Adel, and Sanjay Yedur
Electron Beam Nanolithography; Elizabeth A. Dobisz, Zvonimir Z. Bandic, and Martin C. Peckerar
Index